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Effect of relative humidity on adhesion and frictional properties of micro- and nano-scopic contacts
KTH, School of Chemical Science and Engineering (CHE), Chemistry, Surface Chemistry.
2005 (English)In: Journal of Adhesion Science and Technology, ISSN 0169-4243, E-ISSN 1568-5616, Vol. 19, no 05-mar, 165-179 p.Article in journal (Refereed) Published
Abstract [en]

The effect of relative humidity (RH) oil the interactions of AFM tips and colloidal probes with hydrophilic silica substrates is investigated. Both friction and adhesion are studied. For the case of a colloidal probe the interaction is characteristic of a multiasperity contact, the adhesion increased with increasing RH and above a certain threshold relative humidity a large increase in adhesion was measured. This behaviour is explained in terms of a recent model where the Kelvin radius of the condensate becomes larger than some characteristic roughness on the surface. The interaction between the tip and the substrate also exhibited an increase in adhesion above a threshold RH although the increase was much less marked than with the colloid probe. The friction decreased with increasing humidity for both tip and colloid probe although the friction force was much less sensitive than adhesion to changes in RH. Stick-slip behaviour was observed between tip and substrate for all humidities at high loads, but only at the lowest RH (about 5%) it was observed at all loads. At higher humidity the behaviour became increasingly continuum on the experimental timescale, presumably due to viscous contributions from the water. Stick-slip was not observed for the colloidal probe friction measurements.

Place, publisher, year, edition, pages
2005. Vol. 19, no 05-mar, 165-179 p.
Keyword [en]
friction, adhesion, capillary condensation, atomic force microscope, surface force, atomic-force microscopy, torsional spring constant, nanoscale rough surfaces, molecularly thin-films, capillary condensation, silica surfaces, kelvin equation, water, afm, air
URN: urn:nbn:se:kth:diva-14928ISI: 000230670600004ScopusID: 2-s2.0-22544453595OAI: diva2:332969
QC 20100525Available from: 2010-08-05 Created: 2010-08-05Bibliographically approved

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Rutland, Mark W
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