Adhesion of microwave-plasma-treated fluoropolymers to thermoset vinylester
2005 (English)In: Journal of Applied Polymer Science, ISSN 0021-8995, E-ISSN 1097-4628, Vol. 98, no 2, 838-842 p.Article in journal (Refereed) Published
Poly(tetrafluoroethylene) and a fluoroethylene copolymer were surface treated with a 2.45-GHz microwave plasma to enhance their adhesion to a vinylester thermoset. The plasmas were generated with an inert gas (Ar) and with reactive gases (H-2, O-2, and N-2). The lap-joint shear stress was measured on fluoropolymer samples glued with the vinylester. In general, the stress at failure increased with increasing plasma-energy dose. The H, plasma yielded the best adhesion, and X-ray photoelectron spectroscopy revealed that it yielded the highest degree of defluorination of the fluoropolymer surface. The defluorination efficiency declined in the order H-2, Ar, O-2, and N-2. Contact angle measurements and scanning electron microscopy revealed that the surface roughness of the fluoropolymer depended on the rate of achieving the target energy dose. High power led to a smoother surface, probably because of a greater increase in temperature and partial melting.
Place, publisher, year, edition, pages
2005. Vol. 98, no 2, 838-842 p.
poly(tetrafluoroethylene), poly(fluoroethylene-co-fluoropropylene), vinylester thermoset, adhesion, plasma, linked polytetrafluoroethylene ptfe, induced cross-linking, surface modification, low-pressure, radiation, poly(tetrafluoroethylene), polymers, wettability, esr, rf
IdentifiersURN: urn:nbn:se:kth:diva-15018DOI: 10.1002/app.22174ISI: 000231680500040ScopusID: 2-s2.0-27744527457OAI: oai:DiVA.org:kth-15018DiVA: diva2:333059
QC 201005252010-08-052010-08-052012-05-04Bibliographically approved