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High-temperature treatment of hydrogen loaded GeO2: SiO2 glasses for photonic device fabrication
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2006 (English)In: Journal of Non-Crystalline Solids, ISSN 0022-3093, E-ISSN 1873-4812, Vol. 352, no 07-jun, 494-499 p.Article in journal (Refereed) Published
Abstract [en]

High-temperature treatment of hydrogen loaded silica- and germanium doped silica glass, also referred to as OH flooding, has been studied. The removal mechanism of hydroxyl groups in silica glass, during OH flooding, occurs by formation and diffusion of molecular hydrogen, while in germanium doped silica the main diffusion mechanism is attributed to diffusion of molecular water. UV exposure of OH flooded and non-treated germanium doped silica samples, from a ArF laser at 193 nm, show large changes in the asymmetric stretching vibration of Si-O-Si bridges, indicating compaction of the glass network. In addition, the thermal relaxation kinetics of the UV induced compaction are found to be similar for non-treated samples and OH flooded samples.

Place, publisher, year, edition, pages
2006. Vol. 352, no 07-jun, 494-499 p.
Keyword [en]
optical fibers, planar waveguides, glasses, laser-matter interactions, photoinduced effects, silica, structure, optical fibers, vitreous silica, index changes, wave-guides, photosensitivity, h-2
URN: urn:nbn:se:kth:diva-15659ISI: 000237404700005OAI: diva2:333701
QC 20100525Available from: 2010-08-05 Created: 2010-08-05Bibliographically approved

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Fokine, Michael
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