Waveguide writing by CO2 laser annealing on sputtered silica film
2006 (English)In: Journal of Non-Crystalline Solids, ISSN 0022-3093, E-ISSN 1873-4812, Vol. 352, no 07-jun, 664-668 p.Article in journal (Refereed) Published
We present a novel method for creating refractive-index structures in sputtered silica film using CO2 laser annealing. The silica film was prepared by radio frequency magnetron sputtering on silica substrate. Deposited film with the refractive-index 0.8% higher than that of the silica substrate was realized, with a propagation loss of 0.4 dB/cm. The refractive-index of the silica film could be reduced by CO2 laser annealing, enabling the formation of cladding structure for 2-D waveguide.
Place, publisher, year, edition, pages
2006. Vol. 352, no 07-jun, 664-668 p.
planar waveguides, sputtering, FTIR measurements, silica, temperature, ellipsometry, sio2
IdentifiersURN: urn:nbn:se:kth:diva-15660ISI: 000237404700030OAI: oai:DiVA.org:kth-15660DiVA: diva2:333702
QC 201005252010-08-052010-08-05Bibliographically approved