Change search
ReferencesLink to record
Permanent link

Direct link
Waveguide writing by CO2 laser annealing on sputtered silica film
2006 (English)In: Journal of Non-Crystalline Solids, ISSN 0022-3093, E-ISSN 1873-4812, Vol. 352, no 07-jun, 664-668 p.Article in journal (Refereed) Published
Abstract [en]

We present a novel method for creating refractive-index structures in sputtered silica film using CO2 laser annealing. The silica film was prepared by radio frequency magnetron sputtering on silica substrate. Deposited film with the refractive-index 0.8% higher than that of the silica substrate was realized, with a propagation loss of 0.4 dB/cm. The refractive-index of the silica film could be reduced by CO2 laser annealing, enabling the formation of cladding structure for 2-D waveguide.

Place, publisher, year, edition, pages
2006. Vol. 352, no 07-jun, 664-668 p.
Keyword [en]
planar waveguides, sputtering, FTIR measurements, silica, temperature, ellipsometry, sio2
URN: urn:nbn:se:kth:diva-15660ISI: 000237404700030OAI: diva2:333702
QC 20100525Available from: 2010-08-05 Created: 2010-08-05Bibliographically approved

Open Access in DiVA

No full text

Search in DiVA

By author/editor
Fokine, Michael
In the same journal
Journal of Non-Crystalline Solids

Search outside of DiVA

GoogleGoogle Scholar
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Total: 21 hits
ReferencesLink to record
Permanent link

Direct link