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Reliability study of ultra-thin gate oxides on strained-Si/SiGe MOS structures
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2006 (English)In: Materials Science & Engineering: B. Solid-state Materials for Advanced Technology, ISSN 0921-5107, E-ISSN 1873-4944, Vol. 135, no 3, 203-206 p.Article in journal (Refereed) Published
Abstract [en]

The reliability of gate oxides on bulk Si and strained Si (s-Si) has been evaluated using constant voltage stressing (CVS) to investigate their breakdown characteristics. The s-Si architectures exhibit a shorter life time compared to that of bulk Si, which is attributed to higher bulk oxide charges (Q(ox)) and increased surface roughness in the s-Si structures. The gate oxide in the s-Si structure exhibits a hard breakdown (HBD) at 1.9 x 10(4) s, whereas HBD is not observed in bulk Si up to a measurement period of 1.44 x 10(5) s. The shorter lifetime of the s-Si gate oxide is attributed to a larger injected charge (Q(inj)) compared to Q(inj) in bulk Si. Current-voltage (I-V) measurements for bulk Si samples at different stress intervals show an increase in stress induced leakage current (SILC) of two orders in the low voltage regime from zero stress time to up to 5 x 10(4) s. In contrast, superior performance enhancements in terms of drain current, maximum transconductance and effective channel mobility are observed in s-Si MOSFET devices compared to bulk Si. The results from this study indicate that further improvement in gate oxide reliability is needed to exploit the sustained performance enhancement of s-Si devices over bulk Si.

Place, publisher, year, edition, pages
2006. Vol. 135, no 3, 203-206 p.
Keyword [en]
strained Si, SiGe, reliability, gate oxide, constant voltage stress, si mosfets, prediction
National Category
Physical Sciences
Identifiers
URN: urn:nbn:se:kth:diva-16190DOI: 10.1016/j.mseb.2006.08.005ISI: 000242654400008Scopus ID: 2-s2.0-33750717568OAI: oai:DiVA.org:kth-16190DiVA: diva2:334232
Note

QC 20100525, QC 20110929. Conference: Symposium on From Strained Silicon to Nanotubes - Novel Channels for Field Effects Devices held at the Spring Meeting of the E-MRS. Nice, FRANCE. MAY 29-JUN 02, 2006

Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2017-12-12Bibliographically approved

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Hellström, Per-Erik

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