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The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge
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2006 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 515, no 4, 1522-1526 p.Article in journal (Refereed) Published
Abstract [en]

The energy distribution of sputtered and ionized metal atoms as well as ions from the sputtering gas is reported for a high power impulse magnetron sputtering (HIPIMS) discharge. High power pulses were applied to a conventional planar circular magnetron Ti target. The peak power on the target surface was 1-2 kW/cm(2) with a duty factor of about 0.5%. Time resolved, and time averaged ion energy distributions were recorded with an energy resolving quadrupole mass spectrometer. The ion energy distributions recorded for the HIPIMS discharge are broader with maximum detected energy of 100 eV and contain a larger fraction of highly energetic ions (about 50% with E-i > 20 eV) as compared to a conventional direct current magnetron sputtering discharge. The composition of the ion flux was also determined, and reveals a high metal fraction. During the most intense moment of the discharge, the ionic flux consisted of approximately 50% Ti1+, 24% Ti2+, 23% Ar1+, and 3% Ar2+ ions.

Place, publisher, year, edition, pages
2006. Vol. 515, no 4, 1522-1526 p.
Keyword [en]
sputtering, HIPIMS, mass spectometry, plasma characterization, ionization, deposition, densities, films
URN: urn:nbn:se:kth:diva-16213DOI: 10.1016/j.tsf.2006.04.051ISI: 000242931900046ScopusID: 2-s2.0-33750834234OAI: diva2:334255
QC 20100525Available from: 2010-08-05 Created: 2010-08-05Bibliographically approved

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Brenning, Nils
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Space and Plasma Physics
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