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Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting
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2007 (English)In: Nano letters (Print), ISSN 1530-6984, E-ISSN 1530-6992, Vol. 7, no 2, 233-237 p.Article in journal (Refereed) Published
Abstract [en]

Thiol-ene photopolymers were studied as patternable resins for nanocontact molding imprint lithography. Photopolymerizable thiol and ene monomer mixtures were used, and after molding, patterned thiol-ene polymer features the size and shape of the original molds were replicated. Adhesion and release were examined and controlled by manipulating the surface chemistry of the substrate and mold. A direct correlation between cured thiol-ene polymer modulus and pattern fidelity was observed.

Place, publisher, year, edition, pages
2007. Vol. 7, no 2, 233-237 p.
Keyword [en]
lithography, mold, features
Identifiers
URN: urn:nbn:se:kth:diva-16386DOI: 10.1021/nl061217fISI: 000244206500003OAI: oai:DiVA.org:kth-16386DiVA: diva2:334428
Note
QC 20100525Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2017-12-12Bibliographically approved

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Malkoch, Michael

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