Change search
ReferencesLink to record
Permanent link

Direct link
Image reversal for direct electron beam patterning of protein coated surfaces
KTH, School of Engineering Sciences (SCI), Applied Physics, Nanostructure Physics.ORCID iD: 0000-0001-8534-6577
2007 (English)In: Lab on a Chip, ISSN 1473-0197, E-ISSN 1473-0189, Vol. 7, no 11, 1603-1606 p.Article in journal (Refereed) Published
Abstract [en]

Electron beam lithography (EBL) is used to create surfaces with protein patterns, which are characterized by immunofluorescence and atomic force microscopies. Both negative and positive image processes are realized by electron beam irradiation of proteins absorbed on a silicon surface, where image reversal is achieved by selectively binding a second species of protein to the electron beam exposed areas on the first protein layer. Biofunctionality at the cellular level was established by culturing cortical cells on patterned lines of fibronectin adsorbed on a bovine serum albumin background for 7 days in culture.

Place, publisher, year, edition, pages
2007. Vol. 7, no 11, 1603-1606 p.
Keyword [en]
self-assembled monolayers, lithography, cells
URN: urn:nbn:se:kth:diva-17071DOI: 10.1039/b710991aISI: 000250428200039ScopusID: 2-s2.0-35549001755OAI: diva2:335114
QC 20100525Available from: 2010-08-05 Created: 2010-08-05Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full textScopus

Search in DiVA

By author/editor
Haviland, David B.
By organisation
Nanostructure Physics
In the same journal
Lab on a Chip

Search outside of DiVA

GoogleGoogle Scholar
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Altmetric score

Total: 25 hits
ReferencesLink to record
Permanent link

Direct link