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Image reversal for direct electron beam patterning of protein coated surfaces
KTH, School of Engineering Sciences (SCI), Applied Physics, Nanostructure Physics.ORCID iD: 0000-0001-8534-6577
2007 (English)In: Lab on a Chip, ISSN 1473-0197, E-ISSN 1473-0189, Vol. 7, no 11, 1603-1606 p.Article in journal (Refereed) Published
Abstract [en]

Electron beam lithography (EBL) is used to create surfaces with protein patterns, which are characterized by immunofluorescence and atomic force microscopies. Both negative and positive image processes are realized by electron beam irradiation of proteins absorbed on a silicon surface, where image reversal is achieved by selectively binding a second species of protein to the electron beam exposed areas on the first protein layer. Biofunctionality at the cellular level was established by culturing cortical cells on patterned lines of fibronectin adsorbed on a bovine serum albumin background for 7 days in culture.

Place, publisher, year, edition, pages
2007. Vol. 7, no 11, 1603-1606 p.
Keyword [en]
self-assembled monolayers, lithography, cells
Identifiers
URN: urn:nbn:se:kth:diva-17071DOI: 10.1039/b710991aISI: 000250428200039Scopus ID: 2-s2.0-35549001755OAI: oai:DiVA.org:kth-17071DiVA: diva2:335114
Note
QC 20100525Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2017-12-12Bibliographically approved

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Haviland, David B.

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