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Double-layer fabrication scheme for large-area polymeric photonic crystal membrane on silicon surface by multibeam interference lithography
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2008 (English)In: Optics Letters, ISSN 0146-9592, E-ISSN 1539-4794, Vol. 33, no 12, p. 1303-1305Article in journal (Refereed) Published
Abstract [en]

We report on the fabrication of two-dimensional polymeric photonic crystal membranes on the surface of silicon using visible-light multibeam interference lithography. The structures are created by the interference of three beams of a green laser. A polymer buffer layer doped with a Rhodamine B laser dye, interlaid between the lithography layer and the silicon substrate, suppresses the effects of strong reflection and nonradiative absorption of silicon on the interference pattern. Large-area defect-free photonic crystal membranes are experimentally realized on silicon surface.

Place, publisher, year, edition, pages
2008. Vol. 33, no 12, p. 1303-1305
Keywords [en]
arrays, light, laser
Identifiers
URN: urn:nbn:se:kth:diva-17674ISI: 000257425900007OAI: oai:DiVA.org:kth-17674DiVA, id: diva2:335719
Note
QC 20100525Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2017-12-12Bibliographically approved

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He, Sailing

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