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Fabrication of submicron structures in nanoparticle/polymer composite by holographic lithography and reactive ion etching
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2008 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 93, no 20Article in journal (Refereed) Published
Abstract [en]

We report on the fabrication of nanoparticle/polymer submicron structures by combining holographic lithography and reactive ion etching. Silica nanoparticles are uniformly dispersed in a (SU8) polymer matrix at a high concentration, and in situ polymerization (cross-linking) is used to form a nanoparticle/polymer composite. Another photosensitive SU8 layer cast upon the nanoparticle/SU8 composite layer is structured through holographic lithography, whose pattern is finally transferred to the nanoparticle/SU8 layer by the reactive ion etching process. Honeycomb structures in a submicron scale are experimentally realized in the nanoparticle/SU8 composite.

Place, publisher, year, edition, pages
2008. Vol. 93, no 20
Keyword [en]
holography, honeycomb structures, nanocomposites, nanotechnology, photolithography, polymerisation, silicon compounds, sputter etching, interference lithography, arrays, silicon, light, su-8
URN: urn:nbn:se:kth:diva-17999DOI: 10.1063/1.2998541ISI: 000261141400079OAI: diva2:336044
QC 20100525Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2013-11-19Bibliographically approved

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He, Sailing
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