Change search
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf
Experimental demonstration of a cross-order echelle grating triplexer based on an amorphous silicon nanowire platform
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.
KTH, School of Information and Communication Technology (ICT), Centres, Kista Photonics Research Center, KPRC.
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.ORCID iD: 0000-0001-5967-2651
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.ORCID iD: 0000-0002-3401-1125
Show others and affiliations
2009 (English)In: Optics Letters, ISSN 0146-9592, E-ISSN 1539-4794, Vol. 34, no 3, 383-385 p.Article in journal (Refereed) Published
Abstract [en]

We present the design, fabrication, and characterization of an ultracompact silicon-on-insulator-based echelle grating triplexer. It is based on the cross-order design, which utilizes different diffraction orders to cover a large spectral range from 1.3 to 1.5 mu m with three channels located at 1310, 1490, and 1550 nm and with a footprint of 150 mu m X 130 mu m.

Place, publisher, year, edition, pages
2009. Vol. 34, no 3, 383-385 p.
Keyword [en]
passive optical network, wave-guides, design, circuit
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-18212ISI: 000263755800054Scopus ID: 2-s2.0-59249101711OAI: oai:DiVA.org:kth-18212DiVA: diva2:336258
Note
QC 20100525Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2017-12-12Bibliographically approved
In thesis
1. Design, Fabrication and Characterization of Planar Lightwave Circuits Based on Silicon Nanowire Platform
Open this publication in new window or tab >>Design, Fabrication and Characterization of Planar Lightwave Circuits Based on Silicon Nanowire Platform
2009 (English)Doctoral thesis, comprehensive summary (Other academic)
Abstract [en]

Optical devices based on Planar Lightwave Circuit (PLC) technology have well been studied due to their inherited advantages from Integrated Circuits (IC), such as: small size, high reliability, mass production and potential integration with microelectronics. Among all the materials, silicon nanowire platform gains more and more interest. The large refractive index difference between core and cladding allows tremendous reduction of the component size. This thesis studies theoretically and experimentally some integrated optical devices based on silicon nanophotonic platform, including echelle grating demultiplexers and photonic crystals.

Some of the numerical methods are introduced first. Scalar integral diffraction method is efficient for calculating the diffraction efficiency of gratings. Beam propagation method and finite-difference time-domain method are also introduced, for simulating the light propagation along the devices.

The fabrication technology and characterization methods are described. The fabrication steps involve: plasma assisted film deposition, E-beam lithography, RIE-etching. All these steps are proceeded under cleanroom environment. The characterization is mainly based on two methods: end-fire coupling and vertical grating coupling. The grating coupler is more efficient compared with the butt-coupling between fiber and nanowires, but is worse solution for final packaging.

Two types of components have been realized and characterized with the above technology. The echelle grating demultiplexer is one of the key components in WDM networks. A method for increasing the diffraction efficiency based on total internal reflection is applied, and a significant improvement of the diffraction efficiency of more than 3dB is achieved. A novel cross-order echelle grating-based triplexer, a bidirectional transceiver for application in the Passive Optical Networks (PON), has been designed and fabricated, which can multi/demultiplex three channels located at 1310nm, 1490nm and 1550nm. Polarization dependence issue of echelle grating demultiplexers has been studied. Two polarization compensation schemes have been proposed, which are for the first time polarization insensitive designs of echelle grating demultiplexers based on silicon nanowire platform.

Photonic crystal devices are also addressed in the thesis. There has been little research on the photonic crystal cavity based on pillar type. A silicon pillar type photonic crystal cavity has been fabricated with the measured Q value as high as about 104, and with an extremely high sensitivity for the changing of the background material or the effective diameter of the pillars. This kind of structure has the advantage on sensing applications compared to the air-hole type structure.

Place, publisher, year, edition, pages
Stockholm: KTH, 2009. 62 p.
Series
Trita-ICT/MAP, 2009:5
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
urn:nbn:se:kth:diva-10620 (URN)
Public defence
2009-06-12, C1,Electrum 1, Isafjordsgatan 26, Kista, 10:00 (English)
Opponent
Supervisors
Note
QC 20100820Available from: 2009-06-04 Created: 2009-06-04 Last updated: 2011-11-28Bibliographically approved

Open Access in DiVA

No full text

Other links

Scopushttp://apps.isiknowledge.com/full_record.do?product=UA&search_mode=GeneralSearch&qid=1&SID=R1hpp6G62A9fKd2n6M3&page=1&doc=1&colname=WOS

Authority records BETA

Wosinski, LechHe, Sailing

Search in DiVA

By author/editor
Zhu, NingSong, JunWosinski, LechHe, SailingThylén, Lars
By organisation
Microelectronics and Applied Physics, MAPKista Photonics Research Center, KPRCElectromagnetic EngineeringOptics and Photonics
In the same journal
Optics Letters
Electrical Engineering, Electronic Engineering, Information Engineering

Search outside of DiVA

GoogleGoogle Scholar

urn-nbn

Altmetric score

urn-nbn
Total: 133 hits
CiteExportLink to record
Permanent link

Direct link
Cite
Citation style
  • apa
  • harvard1
  • ieee
  • modern-language-association-8th-edition
  • vancouver
  • Other style
More styles
Language
  • de-DE
  • en-GB
  • en-US
  • fi-FI
  • nn-NO
  • nn-NB
  • sv-SE
  • Other locale
More languages
Output format
  • html
  • text
  • asciidoc
  • rtf