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Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.
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2009 (English)In: Journal of Lightwave Technology, ISSN 0733-8724, E-ISSN 1558-2213, Vol. 27, no 19, 4306-4310 p.Article in journal (Refereed) Published
Abstract [en]

Focused-ion-beam directly milling strategy was used to fabricate photonic resonators on crystalline silicon-on-insulator substrate. In order to reduce damages such as implanting ions, amorphous layers and re-deposition process which are induced by the ions, a sacrificed silica layer was used as an etching mask and a silicon thermal oxidation process was performed. The transmission spectra of both photonic crystal cavities and micro-ring resonators were measured. The resulting data demonstrate that the Q factors are significantly improved after the oxidation treatment.

Place, publisher, year, edition, pages
2009. Vol. 27, no 19, 4306-4310 p.
Keyword [en]
Focused-ion-beam, micro-ring resonator, photonic crystals, silicon, thermal oxidation, crystal slabs, wave-guides, microring resonator, silicon chip, transmission, technology, nanocavity, filters, damage
Identifiers
URN: urn:nbn:se:kth:diva-18731DOI: 10.1109/JLT.2009.2023607ISI: 000269550600014Scopus ID: 2-s2.0-69949159412OAI: oai:DiVA.org:kth-18731DiVA: diva2:336778
Note

QC 20100525

Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2017-06-07Bibliographically approved

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