Optical Quality Improvement of Si Photonic Devices Fabricated by Focused-Ion-Beam Milling
2009 (English)In: Journal of Lightwave Technology, ISSN 0733-8724, E-ISSN 1558-2213, Vol. 27, no 19, 4306-4310 p.Article in journal (Refereed) Published
Focused-ion-beam directly milling strategy was used to fabricate photonic resonators on crystalline silicon-on-insulator substrate. In order to reduce damages such as implanting ions, amorphous layers and re-deposition process which are induced by the ions, a sacrificed silica layer was used as an etching mask and a silicon thermal oxidation process was performed. The transmission spectra of both photonic crystal cavities and micro-ring resonators were measured. The resulting data demonstrate that the Q factors are significantly improved after the oxidation treatment.
Place, publisher, year, edition, pages
2009. Vol. 27, no 19, 4306-4310 p.
Focused-ion-beam, micro-ring resonator, photonic crystals, silicon, thermal oxidation, crystal slabs, wave-guides, microring resonator, silicon chip, transmission, technology, nanocavity, filters, damage
IdentifiersURN: urn:nbn:se:kth:diva-18731DOI: 10.1109/jlt.2009.2023607ISI: 000269550600014ScopusID: 2-s2.0-69949159412OAI: oai:DiVA.org:kth-18731DiVA: diva2:336778
QC 201005252010-08-052010-08-052011-01-24Bibliographically approved