Cold-developed electron-beam-patterned ZEP 7000 for fabrication of 13 nm nickel zone plates
2009 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 27, no 6, 2593-2596 p.Article in journal (Refereed) Published
Cold development was applied to improve the resolution in a trilayer resist that is used for the fabrication of state-of-the-art soft x-ray microscopy zone plates. By decreasing the temperature of the hexyl acetate developer to -50 degrees C, 11 nm half-pitch gratings have been resolved in the electron-beam resist ZEP 7000. 12 nm half-pitch gratings have been successfully transferred, via the intermediate SiO2 hardmask, into the bottom polyimide layer by CHF3 and O-2 reactive ion etching. The trilayer resist, including optimized cold development, has finally been used in an electroplating-based process for the fabrication of nickel zone plates. Zone plates with down to 13 nm outermost zone width have been fabricated and 2.4% average groove diffraction efficiency has been measured for zone plates with 15 nm outermost zone width and a nickel height of 55 nm.
Place, publisher, year, edition, pages
2009. Vol. 27, no 6, 2593-2596 p.
electron beam lithography, nickel, optical fabrication, resists, zone, plates, x-ray microscopy, resolution, poly(methylmethacrylate), temperature, dynamics
IdentifiersURN: urn:nbn:se:kth:diva-19051DOI: 10.1116/1.3237140ISI: 000272803400055ScopusID: 2-s2.0-72849123318OAI: oai:DiVA.org:kth-19051DiVA: diva2:337098
QC 201005252010-08-052010-08-052011-11-14Bibliographically approved