Process development for improved soft X-ray zone plates
2010 (English)In: Microelectronic Engineering, ISSN 0167-9317, Vol. 87, no 5-8, 1583-1586 p.Article in journal (Refereed) Published
We demonstrate two nanofabrication methods which improve the diffraction efficiency of high-resolution soft X-ray nickel zone plates. First, pulse electroplating is shown to result in uniform diffraction efficiency over the entire zone-plate area. A resulting enhancement of the total efficiency of 20% compared to conventional DC plating was measured. Second, we demonstrate that a high-resolution cold development process can be combined with efficiency-enhancing dry etching into an underlying germanium film. We present 16 nm half-pitch gratings composed of 50 nm nickel on top of 50 nm germanium.
Place, publisher, year, edition, pages
2010. Vol. 87, no 5-8, 1583-1586 p.
Zone plate, Electroplating, Diffraction efficiency, microscopy
Other Engineering and Technologies
IdentifiersURN: urn:nbn:se:kth:diva-19377DOI: 10.1016/j.mee.2009.11.012ISI: 000276300700230ScopusID: 2-s2.0-76949092001OAI: oai:DiVA.org:kth-19377DiVA: diva2:337424
QC 20100525 35th International Conference on Micro-and Nano-Engineering, Ghent, BELGIUM, SEP 28-OCT 01, 20092010-08-052010-08-052011-11-14Bibliographically approved