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Kinetic study of InP: Fe growth by LP-HVPE with ferrocene as Fe source
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.ORCID iD: 0000-0002-0977-2598
2000 (English)In: Journal of the Electrochemical Society, ISSN 0013-4651, Vol. 147, no 2, 744-746 p.Article in journal (Refereed) Published
Abstract [en]

A kinetic study of InP:Fe growth has been carried out in a low pressure hydride vapor phase epitaxy (LP-HVPE) reactor using Ferrocene as iron source. The influence of the ferrocene partial pressure on the growth behavior has been investigated. A drastic decrease of the growth rate in the presence of ferrocene has been experimentally measured. This effect is explained to be due to cyclopentadiene adsorption. A kinetic model, that takes into account this adsorption, is proposed, which explains the observed experimental results.

Place, publisher, year, edition, pages
2000. Vol. 147, no 2, 744-746 p.
URN: urn:nbn:se:kth:diva-19533ISI: 000085294400056OAI: diva2:338225
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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Lourdudoss, Sebastian
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