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Influence of molybdenum on the formation of C54TiSi(2): Template phenomenon versus grain-size effect
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.
2000 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 76, no 14, 1831-1833 p.Article in journal (Refereed) Published
Abstract [en]

Experimental results are presented for the formation of TiSi2 in the presence of an ultrathin Mo layer deposited either at the interface between Ti and Si or on top of Ti/Si. The formation of C54 TiSi2 is clearly shown to be enhanced with a surface Mo layer, although the effect is less pronounced as compared to the use of an interposed Mo layer. The results can be accounted for with a template mechanism where the formation of C40 (Mo, Ti)Si-2 is crucial for the epitaxial growth of C54 TiSi2 atop. Possible grain-size effects on the formation of C54 TiSi2 are also discussed.

Place, publisher, year, edition, pages
2000. Vol. 76, no 14, 1831-1833 p.
Keyword [en]
c49 tisi2, transformation temperature, interposed layer, c54 tisi2, phase
Identifiers
URN: urn:nbn:se:kth:diva-19649ISI: 000086134700013OAI: oai:DiVA.org:kth-19649DiVA: diva2:338341
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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