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A liquid-xenon-jet laser-plasma X-ray and EUV source
KTH, Superseded Departments, Physics.ORCID iD: 0000-0003-2723-6622
2000 (English)In: Microelectronic Engineering, ISSN 0167-9317, E-ISSN 1873-5568, Vol. 53, no 04-jan, 667-670 p.Article in journal (Refereed) Published
Abstract [en]

We describe a laser-plasma soft-x-ray source based on a cryogenic-xenon liquid-jet target. The source is suitable for extreme ultraviolet (EUV) projection lithography and proximity x-ray lithography (PXL). Absolute calibrated spectra in the 1-2 nm range and uncalibrated spectra in the 9-15 nm range are obtained using a free-standing transmission grating and a CCD-detector.

Place, publisher, year, edition, pages
2000. Vol. 53, no 04-jan, 667-670 p.
Keyword [en]
droplet-target, generation, debris, lithography, emission, program
Identifiers
URN: urn:nbn:se:kth:diva-19944ISI: 000088603300145OAI: oai:DiVA.org:kth-19944DiVA: diva2:338636
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2017-12-12Bibliographically approved

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Hertz, Hans M.

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