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Characterization of crystalline TiC films grown by pulsed Nd: YAG laser deposition
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.
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2000 (English)In: Japanese Journal of Applied Physics, ISSN 0021-4922, E-ISSN 1347-4065, Vol. 39, no 7B, 4575-4576 p.Article in journal (Refereed) Published
Abstract [en]

Titanium cal bide (TiC) thin films have been grown on Si (100) substrates using a pulsed neodymium: yttrium-aluminum-garnet (Nd:YAG) laser deposition method. X-ray diffraction (XRD) pattern of the TiC film shows that substrate temperature is one of the most important parameters in the fabrication of crystalline TiC film. Crystalline TiC films can be prepared at substrate temperatures above 500 degrees C. Field emission scanning electron microscope (FE-SEM) indicates that the surface of the film is very smooth and pinhole-free.

Place, publisher, year, edition, pages
2000. Vol. 39, no 7B, 4575-4576 p.
Keyword [en]
titanium carbide, pulsed laser deposition, thin films, substrate temperature, thin-films, ablation, graphite
Identifiers
URN: urn:nbn:se:kth:diva-19986ISI: 000088910000082OAI: oai:DiVA.org:kth-19986DiVA: diva2:338679
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2017-12-12Bibliographically approved

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