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Entangled-state lithography: Tailoring any pattern with a single state
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.ORCID iD: 0000-0002-2082-9583
2001 (English)In: Physical Review Letters, ISSN 0031-9007, E-ISSN 1079-7114, Vol. 86, no 20, 4516-4519 p.Article in journal (Refereed) Published
Abstract [en]

We demonstrate a systematic approach to Heisenberg-Limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N + 1) X (N + 1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.

Place, publisher, year, edition, pages
2001. Vol. 86, no 20, 4516-4519 p.
Keyword [en]
projection synthesis, evolution
Identifiers
URN: urn:nbn:se:kth:diva-20616ISI: 000168623500023OAI: oai:DiVA.org:kth-20616DiVA: diva2:339312
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2017-12-12Bibliographically approved

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Björk, Gunnar

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