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Influence of laser pulse width on absolute EUV-yield from Xe-clusters
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2001 (English)In: European Physical Journal D: Atomic, Molecular and Optical Physics, ISSN 1434-6060, E-ISSN 1434-6079, Vol. 14, no 3, 331-335 p.Article in journal (Refereed) Published
Abstract [en]

Using 50 fs (similar to 2 x 10(18) W/cm(2)) and 2 ps (similar to 5 x 10(16) W/cm(2)) pulses from a Ti:Sa multi-TW laser at 800 nm wavelength large Xe-clusters (10(5)...10(6) atoms per cluster) have been excited. Absolute yield measurements of EUV-emission in a wavelength range between 10 nm and 15 nm in combination with cluster target variation were carried out. The ps-laser pulse has resulted in about 30% enhanced and spatially more uniform EUV-emission compared to fs-laser excitation. Circularly polarized laser light instead of linear polarization results in enhanced emission which is probably caused by electrons gaining higher energies by the polarization dependent optical field ionization process. An absolute emission efficiency at 13.4 nm of up to 0.8% in 2 pi sr and 2.2% bandwidth has been obtained.

Place, publisher, year, edition, pages
2001. Vol. 14, no 3, 331-335 p.
Keyword [en]
extreme-ultraviolet, atomic clusters, gas clusters, ray-emission, spectroscopy, lithography, size, kr
URN: urn:nbn:se:kth:diva-20748ISI: 000169575500008OAI: diva2:339445
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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Vogt, Ulrich
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