Subwavelength lithography over extended areas
2001 (English)In: Physical Review A. Atomic, Molecular, and Optical Physics, ISSN 1050-2947, E-ISSN 1094-1622, Vol. 6401, no 1Article in journal (Refereed) Published
We demonstrate a systematic approach to subwavelength resolution Lithographic image formation on films covering areas larger than a wavelength squared. For example, it is possible to make a lithographic pattern with a feature size resolution of lambda/[2(N+1)] by using a particular 2M-photon, multimode entangled state, where N less than or equal toM, and banks of birefringent plates. By preparing such a statistically mixed state, one can form any pixel pattern on a 2(M-N)(N+1) x 2(M-N)(N+1) pixel grid occupying a square with side L = 2(M-N-1)lambda. Hence, there is a trade off between the exposed area, the minimum lithographic feature size resolution, and the number of photons used for the exposure. We also show that the proposed method will work even under nonideal conditions, albeit with somewhat poorer performance.
Place, publisher, year, edition, pages
2001. Vol. 6401, no 1
free optical-images, quantum limits, displacements, entanglement, evolution, states, light
IdentifiersURN: urn:nbn:se:kth:diva-20763ISI: 000169711400118OAI: oai:DiVA.org:kth-20763DiVA: diva2:339460
QC 201005252010-08-102010-08-10Bibliographically approved