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Absolute extreme ultraviolet yield from femtosecond-laser-excited Xe clusters
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2001 (English)In: Physical Review E. Statistical, Nonlinear, and Soft Matter Physics, ISSN 1063-651X, E-ISSN 1095-3787, Vol. 6403, no 3Article in journal (Refereed) Published
Abstract [en]

Large Xe clusters (10(5)-10(6) atoms per cluster) have been irradiated with ultrashort (50 fs) and high-intensity (similar to2 x 10(18) W/cm(2)) pulses from a Ti:sapphire multi-TW laser at 800 nm wavelength. Scaling and absolute yield measurements of extreme ultraviolet (EUV) emission in a wavelength range between 7 and 15 nm in combination with cluster target characterization have been used for yield optimization. Maximum emission as a function of the backing pressure and a spatial emission anisotropy covering a factor of two at optimized yields is discussed with a simple model of the source geometry and EUV-radiation absorption. Circularly polarized laser light instead of linear polarization results in a factor of 2.5 higher emission in the 11 to 15 nm wavelength range. This indicates the initial influence of optical-field ionization for the interaction parameter range used and contrasts to collisional heating that seems to influence preferentially higher ionization. Absolute emission efficiency at 13.4 nm of up to 0.5% in 2 pi sr and 2.2% bandwidth has been obtained.

Place, publisher, year, edition, pages
2001. Vol. 6403, no 3
Keyword [en]
atomic clusters, ray-emission, wavelength dependence, synchrotron-radiation, gas clusters, pulses, lithography, ionization, spectroscopy, scattering
Identifiers
URN: urn:nbn:se:kth:diva-20956ISI: 000171136400078OAI: oai:DiVA.org:kth-20956DiVA: diva2:339653
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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Vogt, Ulrich

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