Liquid-jet laser-plasma X-ray sources for microscopy and lithography
2001 (English)In: Journal de Physique IV: Colloque, ISSN 1155-4339, Vol. 11, no PR2, 389-396 p.Article in journal (Refereed) Published
We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid-drop or liquid-jet targets. It is shown that such sources provide practically debris-free, high-flux operation at water-window and EUV wavelengths. This regenerative and solid-density target system holds promise for the generation of high-average power using high-repetition-rate lasers. Application of the source to compact x-ray microscopy, multi layer-op tics characterization and EUV lithography is briefly discussed.
Place, publisher, year, edition, pages
2001. Vol. 11, no PR2, 389-396 p.
droplet-target, generation, emission
IdentifiersURN: urn:nbn:se:kth:diva-20970ISI: 000171208500077OAI: oai:DiVA.org:kth-20970DiVA: diva2:339667
QC 201005252010-08-102010-08-10Bibliographically approved