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Liquid-jet laser-plasma X-ray sources for microscopy and lithography
KTH, Superseded Departments, Physics.ORCID iD: 0000-0003-2723-6622
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2001 (English)In: Journal de Physique IV: Colloque, ISSN 1155-4339, Vol. 11, no PR2, 389-396 p.Article in journal (Refereed) Published
Abstract [en]

We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid-drop or liquid-jet targets. It is shown that such sources provide practically debris-free, high-flux operation at water-window and EUV wavelengths. This regenerative and solid-density target system holds promise for the generation of high-average power using high-repetition-rate lasers. Application of the source to compact x-ray microscopy, multi layer-op tics characterization and EUV lithography is briefly discussed.

Place, publisher, year, edition, pages
2001. Vol. 11, no PR2, 389-396 p.
Keyword [en]
droplet-target, generation, emission
Identifiers
URN: urn:nbn:se:kth:diva-20970ISI: 000171208500077OAI: oai:DiVA.org:kth-20970DiVA: diva2:339667
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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Hertz, Hans M.

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