Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers
2002 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 91, no 12, 10163-10168 p.Article in journal (Refereed) Published
An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state-i.e., O:(oxidize)Al ratio-, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions.
Place, publisher, year, edition, pages
2002. Vol. 91, no 12, 10163-10168 p.
magnetic tunnel-junctions, light assisted oxidation, ballistic magnetoresistance, thermal-stability, room-temperature, ion-beam, interface, barriers, nanocontacts, quality
IdentifiersURN: urn:nbn:se:kth:diva-21586DOI: 10.1063/1.1478791ISI: 000175905200112OAI: oai:DiVA.org:kth-21586DiVA: diva2:340284
QC 201005252010-08-102010-08-10Bibliographically approved