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Quantitative x-ray photoelectron spectroscopy study of Al/AlOx bilayers
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2002 (English)In: Journal of Applied Physics, ISSN 0021-8979, E-ISSN 1089-7550, Vol. 91, no 12, 10163-10168 p.Article in journal (Refereed) Published
Abstract [en]

An x-ray photoelectron spectroscopy (XPS) analysis of Nb/Al wedge bilayers, oxidized by both plasma and natural oxidation, is reported. The main goal is to show that the oxidation state-i.e., O:(oxidize)Al ratio-, structure and thickness of the surface oxide layer, as well as the thickness of the metallic Al leftover, as functions of the oxidation procedure, can be quantitatively evaluated from the XPS spectra. This is relevant to the detailed characterization of the insulating barriers in (magnetic) tunnel junctions.

Place, publisher, year, edition, pages
2002. Vol. 91, no 12, 10163-10168 p.
Keyword [en]
magnetic tunnel-junctions, light assisted oxidation, ballistic magnetoresistance, thermal-stability, room-temperature, ion-beam, interface, barriers, nanocontacts, quality
Identifiers
URN: urn:nbn:se:kth:diva-21586DOI: 10.1063/1.1478791ISI: 000175905200112OAI: oai:DiVA.org:kth-21586DiVA: diva2:340284
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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Åkerman, Johan
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