Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition
2002 (English)In: Optical Engineering: The Journal of SPIE, ISSN 0091-3286, Vol. 41, no 11, 2903-2909 p.Article in journal (Refereed) Published
Cr/Sc multilayers have been grown on Si substrates using dc magnetron sputtering. The multilayers are intended as condenser mirrors in a soft x-ray microscope operating at the wavelength 3.374 nm. They were designed for normal reflection of the first and second orders, with multilayer periods of 1.692 and 3.381 nm, and layer thickness ratios of 0,471 and 0.237, respectively. At-wavelength soft-x-ray reflectivity measurements were carried out using a reflectometer with a compact soft-x-ray laser-plasma source. The multilayers were irradiated during growth with Ar ions, varying both in energy (9 to 113 eV) and flux, in order to stimulate the adatom mobility and improve the interface flatness. It was found that to obtain a maximum soft x-ray reflectivity with a low flux (Cr=0.76, Sc=2.5) of Ar ions a rather high energy of 53 eV was required, Such energy also caused intermixing of the layers. By the use of a solenoid surrounding the substrate, the arriving ion-to-metal flux ratio could be increased 10 times and the required ion energy could be decreased. A high flux (Cr=7.1, Sc=23.1) of low-energy (9 eV) Ar ions yielded the most favorable growth condition, limiting the intermixing with a subsistent good surface flatness.
Place, publisher, year, edition, pages
2002. Vol. 41, no 11, 2903-2909 p.
Cr/Sc, multilayer, reflectivity, ion-assisted sputter deposition, ion energy, ion flux, soft-x-ray microscopy, water window, superlattices, growth, mirrors, roughness, diffraction, microscopy, plasma, films
IdentifiersURN: urn:nbn:se:kth:diva-22046DOI: 10.1117/1.1510750ISI: 000179221000028OAI: oai:DiVA.org:kth-22046DiVA: diva2:340744
QC 201005252010-08-102010-08-10Bibliographically approved