Change search
ReferencesLink to record
Permanent link

Direct link
Enhanced soft x-ray reflectivity of Cr/Sc multilayers by ion-assisted sputter deposition
KTH, Superseded Departments, Physics.ORCID iD: 0000-0003-2723-6622
2002 (English)In: Optical Engineering: The Journal of SPIE, ISSN 0091-3286, Vol. 41, no 11, 2903-2909 p.Article in journal (Refereed) Published
Abstract [en]

Cr/Sc multilayers have been grown on Si substrates using dc magnetron sputtering. The multilayers are intended as condenser mirrors in a soft x-ray microscope operating at the wavelength 3.374 nm. They were designed for normal reflection of the first and second orders, with multilayer periods of 1.692 and 3.381 nm, and layer thickness ratios of 0,471 and 0.237, respectively. At-wavelength soft-x-ray reflectivity measurements were carried out using a reflectometer with a compact soft-x-ray laser-plasma source. The multilayers were irradiated during growth with Ar ions, varying both in energy (9 to 113 eV) and flux, in order to stimulate the adatom mobility and improve the interface flatness. It was found that to obtain a maximum soft x-ray reflectivity with a low flux (Cr=0.76, Sc=2.5) of Ar ions a rather high energy of 53 eV was required, Such energy also caused intermixing of the layers. By the use of a solenoid surrounding the substrate, the arriving ion-to-metal flux ratio could be increased 10 times and the required ion energy could be decreased. A high flux (Cr=7.1, Sc=23.1) of low-energy (9 eV) Ar ions yielded the most favorable growth condition, limiting the intermixing with a subsistent good surface flatness.

Place, publisher, year, edition, pages
2002. Vol. 41, no 11, 2903-2909 p.
Keyword [en]
Cr/Sc, multilayer, reflectivity, ion-assisted sputter deposition, ion energy, ion flux, soft-x-ray microscopy, water window, superlattices, growth, mirrors, roughness, diffraction, microscopy, plasma, films
URN: urn:nbn:se:kth:diva-22046DOI: 10.1117/1.1510750ISI: 000179221000028OAI: diva2:340744
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full text

Search in DiVA

By author/editor
Hertz, Hans M.
By organisation
In the same journal
Optical Engineering: The Journal of SPIE

Search outside of DiVA

GoogleGoogle Scholar
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Altmetric score

Total: 23 hits
ReferencesLink to record
Permanent link

Direct link