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Oxygen annealing effect of photoelectron spectra in SrBi2Ta2O9 film
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2002 (English)In: Japanese Journal of Applied Physics, ISSN 0021-4922, E-ISSN 1347-4065, Vol. 41, no 11B, 6797-6802 p.Article in journal (Refereed) Published
Abstract [en]

Photoelectron spectra have been studied to clarify O-2-annealing effects on the band diagram of the metal-SrBi2Ta2O9 (SBT) junction and ionization energy of SBT films deposited by the pulsed laser, deposition (PLD) method. Photoemission spectra obtained by ultraviolet light irradiation have a threshold of 5.90 eV for the as-deposited SBT film and 5.56 eV for the O-2-annealed one. This shift of the threshold indicates that the annealing treatment has increased the Fermi level by 0.34 eV. On the assumption of a 4.2 eV band gap and 3.5 eV electron affinity for the SBT, as-deposited SBT has been estimated to give a 0.60 eV lower barrier height for holes than that for electrons, which is possibly because of, insufficiently oxidized (Bi2O2)(2+) layers as indicated by X-ray photoelectron spectroscopy (XPS). After annealing in O-2, however, barrier height energies for holes and electrons become closer to each other. These results agree with our previous studies which have reported that the O-2-annealing suppressed the leakage current through SBT and improved the retention characteristics of the metal-ferroelectric-insulator-semiconductor structure.

Place, publisher, year, edition, pages
2002. Vol. 41, no 11B, 6797-6802 p.
Keyword [en]
SBT, PLD, photoyield, XPS, barrier height, O-2-annealing, thin-films, electrodes, bandgap
Identifiers
URN: urn:nbn:se:kth:diva-22483ISI: 000182730300041OAI: oai:DiVA.org:kth-22483DiVA: diva2:341181
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2017-12-12Bibliographically approved

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Grishin, Alexander M.
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Microelectronics and Information Technology, IMIT
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