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Imaging of a laser plasma source at 13 nm wavelength approaching submicrometer resolution
2003 (English)In: Journal de Physique IV: Colloque, ISSN 1155-4339, Vol. 104, 153-156 p.Article in journal (Refereed) Published
Abstract [en]

Radiation in the extreme ultraviolet (EUV) spectral range is of interest for lithography and microscopy. Laser produced plasmas are sources for this kind of radiation. For successful usage it is necessary to study the source properties like size, stability and emitted spectra. For the spatial characterization of such a source a beamline was built up. The source was imaged at 13, 15 and 17 nm wavelength and at different laser energies with a resolution of better than 2 mum. As target material ethanol was used which was excited by a frequency-doubled Nd:YAG laser (lambda=532 nm; 3 ns, 30 Hz). The source was mapped with a zone plate (KZP5: d=2500 mum, Deltar(n)=0,523 mum). With a magnification of 61 the images were taken with a thinned back-illuminated CCD. Additionally a periodic structure was mapped with micrometer resolution, too.

Place, publisher, year, edition, pages
2003. Vol. 104, 153-156 p.
URN: urn:nbn:se:kth:diva-22545ISI: 000183273900038OAI: diva2:341243
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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Vogt, Ulrich
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Journal de Physique IV: Colloque

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