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Quantum lithography: Toward entangled-photon optics
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.ORCID iD: 0000-0002-2082-9583
2003 (English)In: Optics and Spectroscopy, ISSN 0030-400X, E-ISSN 1562-6911, Vol. 94, no 5, 666-674 p.Article in journal (Refereed) Published
Abstract [en]

The advantages of using nonclassical states of light for optical imaging are discussed, with special emphasis on the new field of quantum optical lithography. The classical resolution limit given by the Rayleigh criterion is approximately half of the optical wavelength. However, it has been argued that, by using special quantum states of light and a multiphoton-sensitive material or detector, this limit can be broken. Here, a brief and rigorous overview of this problem is provided, some particularly widespread misconceptions are addressed, and quantum lithography into a practical technology is discussed.

Place, publisher, year, edition, pages
2003. Vol. 94, no 5, 666-674 p.
Keyword [en]
exploiting entanglement, projection synthesis, diffraction limit, images, displacements, state, light, beat
Identifiers
URN: urn:nbn:se:kth:diva-22610ISI: 000183691700003OAI: oai:DiVA.org:kth-22610DiVA: diva2:341308
Note
QC 20100525Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2017-12-12Bibliographically approved

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Björk, Gunnar

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