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A comparison of extended defect formation induced by ion implantation in (0001) and (11(2)over-bar-0) 4H-SiC
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.ORCID iD: 0000-0002-0292-224X
2003 (English)In: Physica. B, Condensed matter, ISSN 0921-4526, Vol. 340, 132-136 p.Article in journal (Refereed) Published
Abstract [en]

We study the effect of substrate orientation on defect formation in 4H-SiC. Both (1 1 (2) over bar 0) and (0 0 0 1) n-type 4H-SiC substrates were implanted with 400 keV P. The various samples, both as-implanted samples and annealed, were studied by Rutherford backscattering and channeling and transmission electron microscopy in an attempt to understand the damage evolution and defect structures resulting from different crystal orientations. Secondary ion mass spectrometry (SIMS) was performed for P elemental profiling before and after annealing. We observe a significantly different damage accumulation in the two directions with a broader amorphous layer formed in the c-cut crystal compared to the a-cut crystal. The annealing of the damage results in a range of different defects including dislocation loops and voids in both a-cut and c-cut crystals. The SIMS profiles show in some cases distinct differences between the two crystal directions.

Place, publisher, year, edition, pages
2003. Vol. 340, 132-136 p.
Keyword [en]
ion implantation, silicon carbide, extended defects
URN: urn:nbn:se:kth:diva-23104ISI: 000188300200021OAI: diva2:341802
QC 20100525Available from: 2010-08-10 Created: 2010-08-10Bibliographically approved

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Linnarsson, Margareta K.
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