A MoM-based design and simulation method for an etched diffraction grating demultiplexer
2004 (English)In: Optics Communications, ISSN 0030-4018, E-ISSN 1873-0310, Vol. 233, no 04-6, 363-371 p.Article in journal (Refereed) Published
A design and simulation method based on the method of moment (MoM) is proposed for an etched diffraction grating (EDG) demultiplexer. The method of moment is used to calculate the surface current, which produces the diffracted field at the image plane, for both polarizations. The present method can be used to design and simulate effectively and accurately an EDG demultiplexer with required specifications (such as the chromatic dispersion and loss variation) for both polarizations and the polarization-dependent loss.
Place, publisher, year, edition, pages
2004. Vol. 233, no 04-6, 363-371 p.
demultiplexer, method of moment, etched diffraction grating, planar waveguide, spectral response, chromatic dispersion, polarization, wave-guide demultiplexer, surface-relief gratings, chromatic dispersion, sharp transitions, flat passband
Atom and Molecular Physics and Optics
IdentifiersURN: urn:nbn:se:kth:diva-23257DOI: 10.1016/j.optcom.2004.01.067ISI: 000220169500017ScopusID: 2-s2.0-1442307755OAI: oai:DiVA.org:kth-23257DiVA: diva2:341955
QC 20100525 QC 201110282010-08-102010-08-102013-11-19Bibliographically approved