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Two-stage design method for realization of photonic bandgap structures with desired symmetries by interference lithography
KTH.
KTH, Superseded Departments, Electromagnetic Theory.ORCID iD: 0000-0002-3401-1125
2004 (English)In: Optics Express, ISSN 1094-4087, E-ISSN 1094-4087, Vol. 12, no 6, 978-983 p.Article in journal (Refereed) Published
Abstract [en]

Interference lithography for the fabrication of photonic crystals is considered. A two-stage design method for realization of photonic bandgap structures with desired symmetries is developed. An optimal photonic crystal with a large bandgap is searched by adjusting some parameters while keeping some basic symmetry of the unit cell unchanged. A nonlinear programming method is then used to find the optimal electric field vectors of the laser beams and realize the desired interference pattern. The present method is useful for a rational and systematical design of new photonic bandgap structures.

Place, publisher, year, edition, pages
2004. Vol. 12, no 6, 978-983 p.
Keyword [en]
noncoplanar beams, crystals, fabrication
National Category
Atom and Molecular Physics and Optics
Identifiers
URN: urn:nbn:se:kth:diva-23296DOI: 10.1364/OPEX.12.000978ISI: 000220594800002Scopus ID: 2-s2.0-2942733562OAI: oai:DiVA.org:kth-23296DiVA: diva2:341994
Note
QC 20100525 QC 20111028Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2017-12-12Bibliographically approved

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He, Sailing

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