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Fabrication of two-dimensional InP-based photonic crystals by chlorine based chemically assisted ion beam etching
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.
KTH, Superseded Departments, Microelectronics and Information Technology, IMIT.
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2004 (English)In: Journal of Vacuum Science & Technology B, ISSN 1071-1023, E-ISSN 1520-8567, Vol. 22, no 2, 707-709 p.Article in journal (Refereed) Published
Abstract [en]

Two-dimensional photonic crystals (PhCs) were etched into InP/(Ga,In)(As,P) planar waveguides using chlorine-based chemical assisted ion beam etching (CAIBE). The processed PhCs were optically characterized by measuring transmission through simple slabs and one-dimensional cavities. The optical performances inside the photonic band gap are much better compared to both previously reported CAIBE results and results obtained with other etching methods. In particular, we measured a record quality factor of 310 for one-dimensional cavities fabricated in this material system.

Place, publisher, year, edition, pages
2004. Vol. 22, no 2, 707-709 p.
Keyword [en]
radiation losses, hole depth, cavities, shape
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-23367DOI: 10.1116/1.1688353ISI: 000221092300045Scopus ID: 2-s2.0-2342466114OAI: oai:DiVA.org:kth-23367DiVA: diva2:342065
Note

QC 20100525 QC 20111031

Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2017-12-12Bibliographically approved

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