Improved emission uniformity from a liquid-jet laser-plasma extreme-ultraviolet source
2004 (English)In: Applied Optics, ISSN 0003-6935, E-ISSN 1539-4522, Vol. 43, no 29, 5452-5457 p.Article in journal (Refereed) Published
Many modern compact soft-x-ray and extreme-ultraviolet (EUV) imaging systems operate with small fields of view and therefore benefit from the use of small high-brightness sources. Such systems include water-window microscopes and ELTV lithography tools. We show that the photon losses in such systems can be minimized while uniformity of object-plane illumination is maintained by controlled scanning of the source. The improved collection efficiency is demonstrated both theoretically and experimentally for a scanned laser-plasma source compared with static sources. A prospective aerial image microscope and a liquid-xenon-jet laser-plasma source are offered as examples of modem imaging tools that may benefit from such scanning of the source.
Place, publisher, year, edition, pages
2004. Vol. 43, no 29, 5452-5457 p.
euv-lithography, performance, design, optics, field
Atom and Molecular Physics and Optics
IdentifiersURN: urn:nbn:se:kth:diva-23814DOI: 10.1364/AO.43.005452ISI: 000224509800005ScopusID: 2-s2.0-7544237965OAI: oai:DiVA.org:kth-23814DiVA: diva2:342513
QC 20100525 QC 201109142010-08-102010-08-102011-09-14Bibliographically approved