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Improved emission uniformity from a liquid-jet laser-plasma extreme-ultraviolet source
KTH, Superseded Departments, Physics.
KTH, Superseded Departments, Physics.
KTH, Superseded Departments, Physics.ORCID iD: 0000-0003-2723-6622
2004 (English)In: Applied Optics, ISSN 0003-6935, E-ISSN 1539-4522, Vol. 43, no 29, 5452-5457 p.Article in journal (Refereed) Published
Abstract [en]

Many modern compact soft-x-ray and extreme-ultraviolet (EUV) imaging systems operate with small fields of view and therefore benefit from the use of small high-brightness sources. Such systems include water-window microscopes and ELTV lithography tools. We show that the photon losses in such systems can be minimized while uniformity of object-plane illumination is maintained by controlled scanning of the source. The improved collection efficiency is demonstrated both theoretically and experimentally for a scanned laser-plasma source compared with static sources. A prospective aerial image microscope and a liquid-xenon-jet laser-plasma source are offered as examples of modem imaging tools that may benefit from such scanning of the source.

Place, publisher, year, edition, pages
2004. Vol. 43, no 29, 5452-5457 p.
Keyword [en]
euv-lithography, performance, design, optics, field
National Category
Atom and Molecular Physics and Optics
Identifiers
URN: urn:nbn:se:kth:diva-23814DOI: 10.1364/AO.43.005452ISI: 000224509800005Scopus ID: 2-s2.0-7544237965OAI: oai:DiVA.org:kth-23814DiVA: diva2:342513
Note
QC 20100525 QC 20110914Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2011-09-14Bibliographically approved

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Hertz, Hans M.

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