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Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments
KTH, Superseded Departments, Physics.
KTH, Superseded Departments, Physics.ORCID iD: 0000-0003-2723-6622
2004 (English)In: Journal of Physics D: Applied Physics, ISSN 0022-3727, E-ISSN 1361-6463, Vol. 37, no 23, 3233-3243 p.Article in journal (Refereed) Published
Abstract [en]

The laser plasma is one of the major contenders as a high-power source for future high-volume-manufacturing extreme ultraviolet lithography systems. Such laser-plasma sources require a target system that allows high-repetition-rate operation with low debris and manageable thermal load at the required high laser power. In this paper, we review the development of the liquid-jet target laser plasmas, from droplets to filaments, with special emphasis on its applicability for high-power extreme ultraviolet generation. We focus on two target systems, the liquid-xenon-jet and the liquid-tin-jet.

Place, publisher, year, edition, pages
2004. Vol. 37, no 23, 3233-3243 p.
Keyword [en]
x-ray generation, gas puff targets, euv-lithography, debris, emission, radiation, hydrogen, elements, power, tin
National Category
Fusion, Plasma and Space Physics
URN: urn:nbn:se:kth:diva-23970DOI: 10.1088/0022-3727/37/23/004ISI: 000225915200005ScopusID: 2-s2.0-10644277296OAI: diva2:342669
QC 20100525 QC 20110927Available from: 2010-08-10 Created: 2010-08-10 Last updated: 2012-03-20Bibliographically approved

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