High efficiency nonuniformgrating coupler by utilizing the lag effect in the dry etching process
2010 (English)In: 2010 Conference on Optical Fiber Communication, Collocated National Fiber Optic Engineers Conference, OFC/NFOEC 2010, 2010, 5465672- p.Conference paper (Refereed)
Utilizing the lag effect in dry etching, a nonuniform silicon-on-insulator grating coupler is designed and fabricated. Over 80% (>-1dB) coupling efficiency is theoretically obtained and experimental coupling efficiency of 55% is achieved for TE polarization.
Place, publisher, year, edition, pages
2010. 5465672- p.
Nanophotonic Wave-Guides, Optical-Fiber
Electrical Engineering, Electronic Engineering, Information Engineering
IdentifiersURN: urn:nbn:se:kth:diva-24371ISI: 000287574100506ScopusID: 2-s2.0-77953917743ISBN: 978-1-55752-884-1OAI: oai:DiVA.org:kth-24371DiVA: diva2:349236
2010 Conference on Optical Fiber Communication, Collocated National Fiber Optic Engineers Conference, OFC/NFOEC 2010; San Diego, CA; United States; 21 March 2010 through 25 March 2010
QC 201009062010-09-062010-09-062014-08-21Bibliographically approved