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High-resolution X-ray photoemission spectroscopy study of AlN nano-columns grown by nitridation of Al nano-squares on Si(111) substrates with ammonia
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.
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2010 (English)In: Thin Solid Films, ISSN 0040-6090, E-ISSN 1879-2731, Vol. 518, no 14, 3632-3639 p.Article in journal (Refereed) Published
Abstract [en]

The growth of AlN nano-columns by ammonium nitridation of Al nano-squares embedded in SiO2 on Si(111) substrates was studied by high-resolution X-ray photoemission spectroscopy from a synchrotron radiation source and scanning electron microscopy (SEM). Selective nitridation of the Al nano-squares on the SiO2 mask was obtained in the temperature window of 600 degrees C-700 degrees C. The well-shaped AlN nano-column arrays with diameters confined by the lateral size of the Al nano-squares (similar to 100 nm) were observed in SEM.

Place, publisher, year, edition, pages
2010. Vol. 518, no 14, 3632-3639 p.
Keyword [en]
Nitridation, Nano-structures, Aluminum nitride, X-ray photoemission spectroscopy, Ammonium
National Category
Materials Engineering
URN: urn:nbn:se:kth:diva-27559DOI: 10.1016/j.tsf.2009.09.088ISI: 000278064600007ScopusID: 2-s2.0-77950615575OAI: diva2:378649
QC 20101216 Korrigering: "The authors acknowledge their fault that during the publication of this paper an error occurred within line 16 of Section 2: Experimental details. The complete and corrected sentence is reproduced below. After PMMA development, the exposed SiO2 wells were etched by RIE in two steps: first in O2:CHF3 (30:20 sccm) at 50 W RF power and 6.67 Pa gas pressure for 5 s, then in Ar:CHF3 (25:25 sccm) at 150 W RF power and 4.00 Pa gas pressure for 10 min, which was sufficient to totally remove the exposed 50 nm thick SiO2 layer."Available from: 2010-12-16 Created: 2010-12-13 Last updated: 2010-12-16Bibliographically approved

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Agnarsson, BjörnGöthelid, Mats
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