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Electron-Impact Liquid-Jet Water-Window X-ray Sources
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics. (BioX)
2010 (English)Licentiate thesis, comprehensive summary (Other academic)
Abstract [en]

This Thesis describes the development and characterization of a soft x-ray liquidjet-anode electron-impact source. With a water-jet target the primary emission is the O Kα line at 525 eV. This is close to the lower edge of the water-window, a spectral region lacking simple laboratory sources. In the hard x-ray regime electronimpact microfocus sources have matured and are simple, stable, reliable, and inexpensive. It would be beneficial if this source concept could be used also for soft x-ray generation.  

Spectral measurements of a 120 W, 30 keV electron beam focused on a 20 μm water jet show an x-ray intensity of up to 3.2 × 1012 ph/(s×sr×line). Combined with source size measurements up to 50 W a maximum brightness of 3.5 × 109 ph/(s×μm2×sr×line) is reported. This makes the brightness comparable to the compact discharge-plasma sources presently used for soft x-ray microscopy. The source appears to be scalable another order of magnitude which would make the brightness equal to that of the laser-plasma sources.

 

Place, publisher, year, edition, pages
Stockholm: Universitetsservice US AB , 2010. , xiii, 37 p.
Series
Trita-FYS, ISSN 0280-316X ; 2010:68
National Category
Engineering and Technology
Identifiers
URN: urn:nbn:se:kth:diva-28622ISBN: 978-91-7415-825-0 (print)OAI: oai:DiVA.org:kth-28622DiVA: diva2:388736
Presentation
2010-12-10, Sal FB42, KTH, Roslagstullsbacken 21, AlbaNova, Stockholm, 10:00
Opponent
Supervisors
Note
QC 20110119Available from: 2011-01-19 Created: 2011-01-18 Last updated: 2012-04-02Bibliographically approved
List of papers
1. High-brightness water-window electron-impact liquid-jet microfocus source
Open this publication in new window or tab >>High-brightness water-window electron-impact liquid-jet microfocus source
2010 (English)In: Applied Physics Letters, ISSN 0003-6951, E-ISSN 1077-3118, Vol. 96, no 8Article in journal (Refereed) Published
Abstract [en]

We demonstrate stable high-brightness operation of an electron-impact water-jet-anode soft x-ray source. A 30 kV, 7.8 W electron beam is focused onto a 20 mu m diameter jet resulting in water-window oxygen line emission at 525 eV/2.36 nm with a brightness of 3.0x10(9) ph/(sx mu m(2)xsrxline). Monte Carlo-based modeling shows good quantitative agreement with the experiments. The source has potential to increase the x-ray power and brightness by another 1-2 orders of magnitude and fluid-dynamical jet instabilities is determined to be the most important limiting factor. The source properties make it an attractive alternative for table-top x-ray microscopy.

Keyword
electron beam effects, flow instability, jets, Monte Carlo methods, X-ray microscopy, X-ray production, x-ray source
National Category
Engineering and Technology
Identifiers
urn:nbn:se:kth:diva-19265 (URN)10.1063/1.3310281 (DOI)000275027200093 ()2-s2.0-77749292089 (Scopus ID)
Funder
Swedish Research Council
Note
QC 20100525Available from: 2010-08-05 Created: 2010-08-05 Last updated: 2017-12-12Bibliographically approved
2. Electron-Impact Water-Jet Microfocus Source for Water-Window Microscopy
Open this publication in new window or tab >>Electron-Impact Water-Jet Microfocus Source for Water-Window Microscopy
Show others...
2011 (English)In: 10th International Conference on X-Ray Microscopy / [ed] McNulty, I; Eyberger, C; Lai, B, 2011, Vol. 1365, 152-155 p.Conference paper, Published paper (Refereed)
Abstract [en]

We demonstrate high-brightness operation of an electron-impact water-jet-anode soft x-ray source with an increased power loading of 15 times compared to our previously published results, with a corresponding increase in similar to 525-eV x-ray intensity of 6.4 times. This has been accomplished by improving the vacuum pumping system and the electron focusing optics, and increasing the liquid-jet velocity. The source now operates up to 120-W e-beam power and at a 525-eV brightness of 3.5x10(9) ph/(sx mu m(2)xsrxline). The source concept has potential to increase the x-ray brightness by another order of magnitude by optimizing the e-beam focusing and upgrading the power supply. Currently, spot enlargement with increased power is determined to be the most important limiting factor.

Series
AIP Conference Proceedings, ISSN 0094-243X ; 1365
Keyword
X-ray beamlines; light absorption; electron beams; X-ray spectra
National Category
Accelerator Physics and Instrumentation
Identifiers
urn:nbn:se:kth:diva-73360 (URN)10.1063/1.3625327 (DOI)000298672400034 ()2-s2.0-80053340271 (Scopus ID)
Conference
10th International Conference on X-ray Microscopy. Univ Chicago, Chicago, IL. AUG 15-20, 2010
Note
QC 20120203. Updated from manuscript.Available from: 2012-02-02 Created: 2012-02-02 Last updated: 2014-01-14Bibliographically approved

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Citation style
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