Rapid electron beam assisted patterning of pure cobalt at elevated temperatures via seeded growth
2011 (English)In: Nanotechnology, ISSN 0957-4484, E-ISSN 1361-6528, Vol. 22, no 14, 145305- p.Article in journal (Refereed) Published
A new method of direct, rapid nano- to micro-scale patterning of high purity cobalt is presented. The method utilizes a combination of electron beam induced deposition (EBID) and seeded growth at elevated temperatures below the temperature of spontaneous thermal decomposition. Dicobalt octacarbonyl Co-2(CO)(8) is used as the precursor and carbon as a seed layer. Seeded deposition is carried out in the substrate temperature range from 55 to 75 degrees C. Deposition yield is significantly higher than conventional EBID and magnetotransport measurements indicate that resistivity, 22 mu Omega cm, and saturation magnetization, 1.55 T, are much closer to the corresponding values for bulk Co than those for standard EBID.
Place, publisher, year, edition, pages
2011. Vol. 22, no 14, 145305- p.
Engineering and Technology
IdentifiersURN: urn:nbn:se:kth:diva-31610DOI: 10.1088/0957-4484/22/14/145305ISI: 000287970000006ScopusID: 2-s2.0-79952670642OAI: oai:DiVA.org:kth-31610DiVA: diva2:406225
QC 201103252011-03-252011-03-212013-10-28Bibliographically approved