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Design and fabrication of compact etched diffraction grating demultiplexers based on alpha-Si nanowire technology
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
2009 (English)In: Electronics Letters, ISSN 0013-5194, E-ISSN 1350-911X, no Sp. Iss. SI, 43-45 p.Article in journal (Refereed) Published
Abstract [en]

alpha-Silicon nanowire waveguides and related techniques are studied. An ultra-compact etched diffraction grating demultiplexer with 10 nm spacing is fabricated and characterised. The dimension of the device is around half a millimetre, which is one to two orders of magnitude smaller than conventional silica based devices.

Place, publisher, year, edition, pages
2009. no Sp. Iss. SI, 43-45 p.
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-32707ISI: 000268723800021OAI: oai:DiVA.org:kth-32707DiVA: diva2:411743
Note
QC 20110419Available from: 2011-04-19 Created: 2011-04-18 Last updated: 2017-12-11Bibliographically approved

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