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Nanoscale indentation behavior of pseudo-elastic Ti-Ni thin films
KTH, School of Industrial Engineering and Management (ITM), Materials Science and Engineering, Energy and Furnace Technology.
2008 (English)In: Journal of Alloys and Compounds, ISSN 0925-8388, E-ISSN 1873-4669, Vol. 465, no 1-2, 491-496 p.Article in journal (Refereed) Published
Abstract [en]

48.28 at.%Ti-51.72 at.%Ni thin films were prepared by magnetron sputtering and post-annealed at 450, 500, 550 and 600 degrees C, respectively. The evolution of structure, phase transformation and nanoscale indentation behavior of Ti-Ni thin film annealed at different temperature were investigated by X-ray diffractometer (XRD), differential scanning calorimetry (DSC) and nanoindention test, respectively. The results showed that the as-deposited Ti-Ni thin films were amorphous and crystallized after post-annealing. As the annealing temperature increased from 450 to 600 degrees C, both the content of parent phase (B2) and that of the precipitate phase (Ni4Ti3) increased. Both the phase transformation temperature and the micro-hardness of the annealed Ti-Ni thin films increased as well. Meanwhile, the pseudo-elasticity energy recovery ratio 77 first increased to the maximum value and then decreased with the increasing annealing temperature. It revealed that the annealed Ti-Ni thin film specimens exhibited the highest pseudo-elasticity degree with the largest 71 values under the load of 10 mN.

Place, publisher, year, edition, pages
2008. Vol. 465, no 1-2, 491-496 p.
Keyword [en]
Ti-Ni thin film, Pseudo-elasticity, Phase transformation, Nanoindentation test
Identifiers
URN: urn:nbn:se:kth:diva-33156DOI: 10.1016/j.jallcom.2007.10.118ISI: 000259980000086Scopus ID: 2-s2.0-50149112032OAI: oai:DiVA.org:kth-33156DiVA: diva2:413688
Note
QC 20110429Available from: 2011-04-29 Created: 2011-04-29 Last updated: 2017-12-11Bibliographically approved

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