Nanoscale indentation behavior of pseudo-elastic Ti-Ni thin films
2008 (English)In: Journal of Alloys and Compounds, ISSN 0925-8388, Vol. 465, no 1-2, 491-496 p.Article in journal (Refereed) Published
48.28 at.%Ti-51.72 at.%Ni thin films were prepared by magnetron sputtering and post-annealed at 450, 500, 550 and 600 degrees C, respectively. The evolution of structure, phase transformation and nanoscale indentation behavior of Ti-Ni thin film annealed at different temperature were investigated by X-ray diffractometer (XRD), differential scanning calorimetry (DSC) and nanoindention test, respectively. The results showed that the as-deposited Ti-Ni thin films were amorphous and crystallized after post-annealing. As the annealing temperature increased from 450 to 600 degrees C, both the content of parent phase (B2) and that of the precipitate phase (Ni4Ti3) increased. Both the phase transformation temperature and the micro-hardness of the annealed Ti-Ni thin films increased as well. Meanwhile, the pseudo-elasticity energy recovery ratio 77 first increased to the maximum value and then decreased with the increasing annealing temperature. It revealed that the annealed Ti-Ni thin film specimens exhibited the highest pseudo-elasticity degree with the largest 71 values under the load of 10 mN.
Place, publisher, year, edition, pages
2008. Vol. 465, no 1-2, 491-496 p.
Ti-Ni thin film, Pseudo-elasticity, Phase transformation, Nanoindentation test
IdentifiersURN: urn:nbn:se:kth:diva-33156DOI: 10.1016/j.jallcom.2007.10.118ISI: 000259980000086ScopusID: 2-s2.0-50149112032OAI: oai:DiVA.org:kth-33156DiVA: diva2:413688
QC 201104292011-04-292011-04-292011-04-29Bibliographically approved