On the efficiency of quantum lithography
2011 (English)In: New Journal of Physics, ISSN 1367-2630, Vol. 13, 043028- p.Article in journal (Refereed) Published
Quantum lithography promises, in principle, unlimited feature resolution, independent of wavelength. However, in the literature, at least two different theoretical descriptions of quantum lithography exist. They differ in the extent to which they predict that the photons retain spatial correlation from generation to absorption, and although both predict the same feature size, they vastly differ in predicting how efficiently a quantum lithographic pattern can be exposed. Until recently, essentially all quantum lithography experiments have been performed in such a way that it is difficult to distinguish between the two theoretical explanations. However, last year an experiment was performed that gives different outcomes for the two theories. We comment on the experiment and show that the model that fits the data unfortunately indicates that the trade-off between resolution and efficiency in quantum lithography is very unfavourable.
Place, publisher, year, edition, pages
2011. Vol. 13, 043028- p.
NONLINEAR-OPTICAL LITHOGRAPHY, SUB-RAYLEIGH-RESOLUTION, DIFFRACTION LIMIT, 2-PHOTON EXPOSURE, SUPERRESOLUTION, INTERFERENCE, PROJECTION, PHOTONS, STATES, BEAMS
IdentifiersURN: urn:nbn:se:kth:diva-33704DOI: 10.1088/1367-2630/13/4/043028ISI: 000289994100005ScopusID: 2-s2.0-79955381508OAI: oai:DiVA.org:kth-33704DiVA: diva2:418266
FunderSwedish Research CouncilKnut and Alice Wallenberg Foundation
QC 201105202011-05-202011-05-162011-05-24Bibliographically approved