A magnetron sputtering system for the preparation of patterned thin films and in situ thin film electrical resistance measurements
2007 (English)In: Review of Scientific Instruments, ISSN 0034-6748, E-ISSN 1089-7623, Vol. 78, no 10, 103901- p.Article in journal (Refereed) Published
We describe a versatile three gun magnetron sputtering system with a custom made sample holder for in situ electrical resistance measurements, both during film growth and ambient changes on film electrical properties. The sample holder allows for the preparation of patterned thin film structures, using up to five different shadow masks without breaking vacuum. We show how the system is used to monitor the electrical resistance of thin metallic films during growth and to study the thermodynamics of hydrogen uptake in metallic thin films. Furthermore, we demonstrate the growth of thin film capacitors, where patterned films are created using shadow masks.
Place, publisher, year, edition, pages
2007. Vol. 78, no 10, 103901- p.
HYDROGEN UPTAKE, MG FILMS, RESISTIVITY MEASUREMENTS, PLANAR MAGNETRON, GROWTH, THERMODYNAMICS, TECHNOLOGY, DEPOSITION
Engineering and Technology
IdentifiersURN: urn:nbn:se:kth:diva-35939DOI: 10.1063/1.2793508ISI: 000250589800030ScopusID: 2-s2.0-36048989718OAI: oai:DiVA.org:kth-35939DiVA: diva2:429992
QC 201107062011-07-062011-07-062011-07-06Bibliographically approved