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Etched diffraction grating demultiplexers based on amorphous silicon nanowire platform
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.ORCID iD: 0000-0001-5967-2651
KTH, School of Information and Communication Technology (ICT), Microelectronics and Applied Physics, MAP.ORCID iD: 0000-0002-3401-1125
2008 (English)In: 2008 Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, AOE 2008, 2008Conference paper, Published paper (Refereed)
Abstract [en]

We present some theoretical and experimental results of Etched Diffraction Grating demultiplexer based on amorphous silicon nanowire platform, including issues with polarization sensitivity, diffraction efficiency and an application to triplexer.

Place, publisher, year, edition, pages
2008.
Keyword [en]
Demultiplexers, Etched diffraction grating, Polarization sensitivity, Triplexers, Demultiplexing, Diffraction, Diffraction gratings, Nanowires, Optical communication, Optical fibers, Optical materials, Amorphous silicon
National Category
Metallurgy and Metallic Materials
Identifiers
URN: urn:nbn:se:kth:diva-36761ISI: 000296471700126Scopus ID: 2-s2.0-74549137293ISBN: 978-1-55752-863-6 (print)OAI: oai:DiVA.org:kth-36761DiVA: diva2:431115
Conference
Asia Optical Fiber Communication and Optoelectronic Exposition and Conference, Shanghai, PEOPLES R CHINA, OCT 30-NOV 02, 2008
Note

QC 20110715

Available from: 2011-07-15 Created: 2011-07-14 Last updated: 2014-10-13Bibliographically approved

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Wosinski, LechHe, Sailing

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Output format
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