Change search
ReferencesLink to record
Permanent link

Direct link
Equilibrium analysis of zirconium carbide CVD growth
Show others and affiliations
2007 (English)In: Journal of Crystal Growth, ISSN 0022-0248, E-ISSN 1873-5002, Vol. 307, no 2, 302-308 p.Article in journal (Refereed) Published
Abstract [en]

A chemical equilibrium study was performed to investigate the effect of growth parameters on the constitution in ZrC films grown by chemical vapor deposition (CVD). The equilibrium analysis of the Zr-C-H system demonstrated that ZrC (fec) deposition is favorable and that a certain minimum amount of hydrogen should prevent co-deposition of elemental carbon over a wide range of temperature, pressure, and inlet C/Zr atom ratio. The results of the equilibrium analysis were compared to the phase constitution of films grown by low-pressure metalorganic CVD (< 10(-4) Torr). Only carbon-rich ZrC films were grown and demonstrated the possibility of an aerosolassisted CVD approach to stoichiometric ZrC film growth.

Place, publisher, year, edition, pages
2007. Vol. 307, no 2, 302-308 p.
Keyword [en]
phase equilibria, equilibrium analysis, metalorganic chemical vapor deposition, zirconium carbide
National Category
Materials Engineering
URN: urn:nbn:se:kth:diva-37304DOI: 10.1016/j.jcrysgro.2007.05.039ISI: 000250245900009ScopusID: 2-s2.0-34548415469OAI: diva2:432997
Available from: 2011-08-08 Created: 2011-08-08 Last updated: 2011-08-08Bibliographically approved

Open Access in DiVA

No full text

Other links

Publisher's full textScopus

Search in DiVA

By author/editor
Perez, Rosa J.
By organisation
Computational Thermodynamics
In the same journal
Journal of Crystal Growth
Materials Engineering

Search outside of DiVA

GoogleGoogle Scholar
The number of downloads is the sum of all downloads of full texts. It may include eg previous versions that are now no longer available

Altmetric score

Total: 42 hits
ReferencesLink to record
Permanent link

Direct link