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Analysis method of the effect of fabrication errors on a planar waveguide demultiplexer
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
2006 (English)In: Optical and quantum electronics, ISSN 0306-8919, E-ISSN 1572-817X, Vol. 38, no 15, 1203-1216 p.Article in journal (Refereed) Published
Abstract [en]

The impact of fabrication errors on a planar waveguide demultiplexer is analyzed based on an analytical method. The explicit expression of the transfer function taking into account phase and amplitude errors is presented in order to analyze the loss and crosstalk of the demultiplexer caused by fabrication errors. A basic requirement for the demultiplexer with a certain crosstalk criterion can be easily obtained. Using an etched diffraction grating demultiplexer as an example, it is shown that the analytical results have a good agreement with results from a numerical method.

Place, publisher, year, edition, pages
2006. Vol. 38, no 15, 1203-1216 p.
Keyword [en]
planar waveguide demultiplexer, etched diffraction grating (EDG), phase and amplitude errors, loss, crosstalk, WDM
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-37648DOI: 10.1007/s11082-006-9019-7ISI: 000246078400003Scopus ID: 2-s2.0-33947316289OAI: oai:DiVA.org:kth-37648DiVA: diva2:434644
Available from: 2011-08-16 Created: 2011-08-16 Last updated: 2017-12-08Bibliographically approved

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