Hole mask colloidal lithography on magnetic multilayers for spin torque applications
2010 (English)In: INTERNATIONAL CONFERENCE ON MAGNETISM (ICM 2009) / [ed] Goll, G; Lohneysen, HV; Loidl, A; Pruschke, T; Richter, M; Schultz, L; Surgers, C; Wosnitza, J, BRISTOL: IOP PUBLISHING LTD, DIRAC HOUSE , 2010, Vol. 200, UNSP 072078- p.Conference paper (Refereed)
We demonstrate the fabrication of metallic nano-contacts on magnetic multilayers using a Hole Mask Colloidal Lithography technique (HCL) based on Polystyrene spheres. The method applies PMMA as a sacrificial layer upon which a hole pattern is formed after liftoff of the spheres. An Au layer functions as a hard mask for the PMMA and the PMMA subsequently masks the SiO(2) during its etching. The resulting pattern is a dense collection of randomly located nano-holes through a SiO(2) film. Final devices are made using traditional photolithography to define a 600 nm circular mesa with about 3 to 4 nano-holes per device, and patterning of a metallic top contact.
Place, publisher, year, edition, pages
BRISTOL: IOP PUBLISHING LTD, DIRAC HOUSE , 2010. Vol. 200, UNSP 072078- p.
, Journal of Physics Conference Series, ISSN 1742-6588 ; 200
Engineering and Technology
IdentifiersURN: urn:nbn:se:kth:diva-39659DOI: 10.1088/1742-6596/200/7/072078ISI: 000291321303006ScopusID: 2-s2.0-77957035820OAI: oai:DiVA.org:kth-39659DiVA: diva2:440172
International Conference on Magnetism (ICM 2009). Karlsruhe, GERMANY. JUL 26-31, 2009