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Large area zone plate exposure by fixed beam moving stage lithography
KTH, School of Engineering Sciences (SCI), Applied Physics, Biomedical and X-ray Physics.
2011 (English)Independent thesis Advanced level (degree of Master (Two Years)), 20 credits / 30 HE creditsStudent thesis
Abstract [en]

In this diploma project the so-called fixed beam moving stage (FBMS) module in the Raith 150 electron beam lithography system has been evaluated for making large area zone plate exposures. The project goal, besides the evaluation of the module, has been to find an exposure recipe for exposing zone plates with diameter up to 500 μm. The zone plates fabricated with this method will be used for synchrotron and x-ray free electron laser applications.

The thesis starts with a short introduction to zone plate properties and fabrication procedures. Then the work where FBMS exposed zone plates are compared with normal write field exposures of 75 μm diameter zone plates is described. The conclusion is that for these small diameters, major problems with wobbly zones occur for the FBMS patterns. However, for larger diameters the pattern typically looks better. The final result with large area exposures are excellent zone plate patterns with 500 μm diameter and 100 nm outermost zone width. The total exposure time was 2 h 15 min. This relatively short time indicate that it will be practically possible to use the Raith system for these large area exposures.

Place, publisher, year, edition, pages
2011. , 24 p.
Trita-FYS, ISSN 0280-316X ; 50
National Category
Physical Sciences
URN: urn:nbn:se:kth:diva-44548OAI: diva2:451204
Educational program
Master of Science in Engineering -Engineering Physics
Physics, Chemistry, Mathematics
Available from: 2011-11-01 Created: 2011-10-25 Last updated: 2011-11-01Bibliographically approved

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