Measuring peripheral wavefront aberrations in subjects with large central visual field loss
2004 (English)In: OPHTHALMIC TECHNOLOGIES XIV / [ed] Manns, F; Soderberg, PG; Ho, A, BELLINGHAM: SPIE-INT SOC OPTICAL ENGINEERING , 2004, Vol. 5314, 209-219 p.Conference paper (Refereed)
In a previous study we have shown that correction of peripheral refractive errors can improve the remaining vision in the preferred retinal location (PRL) of subjects with large central visual field loss (CFL). Measuring peripheral refractive errors with traditional methods is often difficult due to the low visual acuity and large aberrations. Therefore a Hartmann-Shack (HS) sensor has been designed to measure peripheral wavefront aberrations in CFL subjects. Method: The HS sensor incorporates an eyetracker and analyzing software designed to handle large wavefront aberrations. To ensure that the measurement axis is aligned with the subject's PRL, a special fixation target has been developed. It consists of concentric rings surrounding the aperture of the HS together with a central fixation mark along the measurement axis. Results: Some initial measurements on subjects with CFL have been performed successfully. As a first step in improving the peripheral optics of the eye, the wavefront data have been used to calculate the subject's optimal eccentric refraction. Conclusion: Measuring the wavefront aberrations is a fast and easy way to assess the details of the optics in subjects with CFL. The wavefront data can then be used to better understand the problems of eccentric correction.
Place, publisher, year, edition, pages
BELLINGHAM: SPIE-INT SOC OPTICAL ENGINEERING , 2004. Vol. 5314, 209-219 p.
, PROCEEDINGS OF THE SOCIETY OF PHOTO-OPTICAL INSTRUMENTATION ENGINEERS (SPIE), ISSN 0277-786X ; 5314
peripheral, wavefront aberrations, Hartmann-Shack sensor, central visual field loss, preferred retinal location, eccentric refraction, unwrapping, Zernike polynomials, root mean square (RMS), Strehl ratio
Atom and Molecular Physics and Optics
IdentifiersURN: urn:nbn:se:kth:diva-43932DOI: 10.1117/12.540885ISI: 000223299200028ScopusID: 2-s2.0-12144252462ISBN: 0-8194-5222-XOAI: oai:DiVA.org:kth-43932DiVA: diva2:451273
14th Conference on Ophthalmic Technologies Location: San Jose, CA. JAN 24-27, 2004. SPIE
QC 201110252011-10-252011-10-192016-05-09Bibliographically approved