Silica-on-silicon technology for photonic integrated devices
2004 (English)In: ICTON 2004: 6TH INTERNATIONAL CONFERENCE ON TRANSPARENT OPTICAL NETWORKS, PROCEEDINGS, VOL 2 / [ed] Marciniak, M, NEW YORK: IEEE , 2004, 274-279 p.Conference paper (Refereed)
Silica-on silicon and silicon-based integrated devices are key components for future all-optical communication networks. New challenging trends in the photonic integration are towards PLCs, based on silicon platforms for monolithic integration of passive dielectric components with semiconductor active photonic devices and electronic circuits. In this paper a novel low temperature Plasma Enhanced Chemical Vapor Deposition (PECVD) technology for silica-based channel waveguides and waveguide devices is presented. Devices based on silica-on-silicon waveguide technology with imprinted Bragg gratings find increasing applications in wavelength-division multiplexed (WDM) optical communication systems as wavelength-selective devices and in optical sensing including biosensors and bioanalytical microtechniques. Presented technologies were applied for the fabrication of some test and new concept devices for optical communication systems. A brief review of these devices is given.
Place, publisher, year, edition, pages
NEW YORK: IEEE , 2004. 274-279 p.
silica-on-silicon technology, PECVD, photonic integrated circuits, UV Bragg gratings, arrayed waveguide gratings, add-drop multiplexers
IdentifiersURN: urn:nbn:se:kth:diva-44702ISI: 000224435100070ScopusID: 2-s2.0-11244343060ISBN: 0-7803-8343-5OAI: oai:DiVA.org:kth-44702DiVA: diva2:451766
6th International Conference on Transparent Optical Networks (ICTON 2004) Location: Wroclaw, POLAND Date: JUL 04-08, 2004
QC 201110272011-10-272011-10-252011-10-27Bibliographically approved