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Design and fabrication of compact etched diffraction grating demultiplexers based on alpha-Si nanowire technology
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
KTH, School of Electrical Engineering (EES), Electromagnetic Engineering.
2008 (English)In: Electronics Letters, ISSN 0013-5194, E-ISSN 1350-911X, Vol. 44, no 13, 816-818 p.Article in journal (Refereed) Published
Abstract [en]

alpha-Silicon nanowire waveguides and related techniques are studied. An ultra-compact etched diffraction grating demultiplexer with 10 nm spacing is fabricated and characterised. The dimension of the device is around half a millimetre, which is one to two orders of magnitude smaller than conventional silica based devices.

Place, publisher, year, edition, pages
2008. Vol. 44, no 13, 816-818 p.
National Category
Electrical Engineering, Electronic Engineering, Information Engineering
Identifiers
URN: urn:nbn:se:kth:diva-47307DOI: 10.1049/el:20081038ISI: 000257785600025Scopus ID: 2-s2.0-45749130586OAI: oai:DiVA.org:kth-47307DiVA: diva2:454706
Note
QC 20111108Available from: 2011-11-08 Created: 2011-11-08 Last updated: 2017-12-08Bibliographically approved

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